FAS Research Computing - Scratch under high load – Häiriön yksityiskohdat

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Status page for the Harvard FAS Research Computing cluster and other resources.

Cluster Utilization (VPN and FASRC login required): Cannon | FASSE


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Scratch under high load

Ratkaistu
Toiminnassa
Alkoi noin 2 vuotta sittenKesti noin tunti
Päivitykset
  • Ratkaistu
    Ratkaistu

    The high I/O job has been identified. Scratch is back to normal operaiton.

  • Tutkitaan
    Tutkitaan

    Scratch performance is degraded.

    holyscratch01 is under abnormally high I/O load.

    We are working to determine which job is the cause.

For issues not shown here, please contact FASRC via
https://portal.rc.fas.harvard.edu or email rchelp@rc.fas.harvard.edu